Relaxation parameters of Cu/substrate coated systems

GRABCO, D. Z.; PYRTSAC, C. M.; SHIKIMAKA, O. A.

dc.contributor.author	GRABCO, D. Z.
dc.contributor.author	PYRTSAC, C. M.
dc.contributor.author	SHIKIMAKA, O. A.
dc.date.accessioned	2021-11-05T09:23:39Z
dc.date.available	2021-11-05T09:23:39Z
dc.date.issued	2018
dc.identifier.citation	GRABCO, D. Z., PYRTSAC, C. M., SHIKIMAKA, O. A. Prolonged holding and cyclic loading indentation of aluminophosphate glass: kinetics of deformation. In: Materials Science and Condensed Matter Physics: proc.: ed. 98, 25-28 sept. 2018, Chişinău, Moldova, 2018, p. 162.	en_US
dc.identifier.uri	http://repository.utm.md/handle/5014/17896
dc.description.abstract	In recent years, special attention has been paid to the development and fabrication of new materials, in particular to the coated systems (CS). From a practical point of view, the relaxation processes under nanoindentation in the film/substrate CS are of a major interest and are studied in present paper. These parameters need to be considered in lithographic technologies that use printing (penetration of resist-marking with a nanometric scale model), recording and storing information by nanoindentation methods in nanomechanical systems.	en_US
dc.language.iso	en	en_US
dc.publisher	Institutul de Fizică Aplicată al AŞM	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	coated systems	en_US
dc.subject	nanoindentations	en_US
dc.subject	films	en_US
dc.subject	substrates	en_US
dc.subject	nanomechanical systems	en_US
dc.subject	lithographic technologies	en_US
dc.title	Relaxation parameters of Cu/substrate coated systems	en_US
dc.type	Article	en_US