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Porous vs. Magnetron RF Sputtering Of InP for Portable THz-TDS in Pharmaceutical and Medical Applications

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dc.contributor.author SIRBU, L.
dc.contributor.author DANILA, M.
dc.contributor.author MULLER, R.
dc.contributor.author GHIMPU, L.
dc.contributor.author DOBLETBAEV, R.
dc.contributor.author DASCALU, T.
dc.contributor.author GRIGORE (SANDU), O.
dc.contributor.author SARUA, A.
dc.contributor.author URSAKI, V.
dc.date.accessioned 2019-10-04T10:48:07Z
dc.date.available 2019-10-04T10:48:07Z
dc.date.issued 2013
dc.identifier.citation SIRBU, L., DANILA, M., MULLER, R. et al. Porous vs. Magnetron RF Sputtering Of InP for Portable THz-TDS in Pharmaceutical and Medical Applications. In: ICNBME-2013. International Conference on Nanotechnologies and Biomedical Engineering. German-Moldovan Workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the 2th intern. conf., April 18-20, 2013. Chişinău, 2013, pp. 161-162. ISBN 978-9975-62-343-8. en_US
dc.identifier.isbn 978-9975-62-343-8
dc.identifier.uri http://repository.utm.md/handle/5014/4618
dc.description.abstract We developed a combination of technology for deposition contacts/wires upon nanoporous InP thin film structures and RF sputtering InP films. Indium phosphide (InP) films were deposited onto glass substrate using RF magnetron sputtering by varying the substrate temperature (50–100oC), under constant argon pressure (6.3•10-3Bar) and RF power (100 W). en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject InP films en_US
dc.subject RF sputterings en_US
dc.subject porous InP en_US
dc.subject THz antenna en_US
dc.subject pelicule subțiri en_US
dc.title Porous vs. Magnetron RF Sputtering Of InP for Portable THz-TDS in Pharmaceutical and Medical Applications en_US
dc.type Article en_US


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