dc.contributor.author | TSIULYANU, D. | |
dc.contributor.author | MOCREAC, O. | |
dc.contributor.author | ENACHI, M. | |
dc.contributor.author | VOLODINA, G. | |
dc.date.accessioned | 2019-10-07T08:57:31Z | |
dc.date.available | 2019-10-07T08:57:31Z | |
dc.date.issued | 2013 | |
dc.identifier.citation | TSIULYANU, D., MOCREAC, O., ENACHI, M. et al. Evidence for the Concentration Induced Extinction of Gas Sensitivity in Amorphous and Nanostructured Te Thin Films. In: ICNBME-2013. International Conference on Nanotechnologies and Biomedical Engineering. German-Moldovan Workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the 2th intern. conf., April 18-20, 2013. Chişinău, 2013, pp. 222-226. ISBN 978-9975-62-343-8. | en_US |
dc.identifier.isbn | 978-9975-62-343-8 | |
dc.identifier.uri | http://repository.utm.md/handle/5014/4624 | |
dc.description.abstract | The extinction of sensitivity to nitrogen dioxide induced by high gas concentration have been observed in ultrathin tellurium films. The phenomenon becomes apparent in both continuous and nanostructured films shown by AFM, SEM and XRD analyses to be in amorphous state. Sensitivity of 30 nm thickness Te film decreases near linearly with concentration increase between 150 and 500 ppb of nitrogen dioxide. The results are explained in terms of formation of a nitrogen dioxide catalytic gate in which a molecule adsorbs (and desorbs) without reacting. | en_US |
dc.language.iso | en | en_US |
dc.publisher | Technical University of Moldova | en_US |
dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.subject | thin films | en_US |
dc.subject | amorphous films | en_US |
dc.subject | nanostructured films | en_US |
dc.subject | films | en_US |
dc.subject | pelicule subțiri | en_US |
dc.subject | pelicule amorfe | en_US |
dc.subject | pelicule nanostructurate | en_US |
dc.title | Evidence for the Concentration Induced Extinction of Gas Sensitivity in Amorphous and Nanostructured Te Thin Films | en_US |
dc.type | Article | en_US |
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