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Nanoporous Zinc Oxide Films Prepared by Magnetron Sputtering
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| dc.contributor.author | GHIMPU, L. | |
| dc.contributor.author | LUPAN, O. | |
| dc.contributor.author | POPESCU, L. | |
| dc.contributor.author | TIGINYANU, I. M. | |
| dc.date.accessioned | 2019-10-15T08:40:55Z | |
| dc.date.available | 2019-10-15T08:40:55Z | |
| dc.date.issued | 2011 | |
| dc.identifier.citation | GHIMPU, L., LUPAN, O., POPESCU, L. et al. Nanoporous Zinc Oxide Films Prepared by Magnetron Sputtering. In: ICNBME-2011. International conference on Nanotechnologies and Biomedical Engineering. German-moldovan workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the intern. conf., July 7-8, 2011. Chişinău, 2011, pp. 138-141. ISBN 978-9975-66-239-0. | en_US |
| dc.identifier.isbn | 978-9975-66-239-0 | |
| dc.identifier.uri | http://repository.utm.md/handle/5014/4681 | |
| dc.description.abstract | In this paper we demonstrate an inexpensive approach for the fabrication of nanoporous zinc oxide films by using magnetron sputtering. Study of the structural properties proves the crystallographic perfection of porous nanostructures and the possibility of its controlling by adjusting the technological parameters in the growth process. The XRD pattern of nanoporous ZnO films exhibits high intensity of the peaks relative to the background signal which is indicative of the ZnO hexagonal phase and a good crystallinity of the samples grown by magnetron sputtering. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Technical University of Moldova | en_US |
| dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
| dc.subject | nanoporous semiconductors | en_US |
| dc.subject | films | en_US |
| dc.subject | magnetron sputtering | en_US |
| dc.title | Nanoporous Zinc Oxide Films Prepared by Magnetron Sputtering | en_US |
| dc.type | Article | en_US |
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