dc.contributor.author | COJOCARU, A. | |
dc.contributor.author | CARSTENSEN, J. | |
dc.contributor.author | BOOR, J. | |
dc.contributor.author | SCHMIDT, V. | |
dc.contributor.author | FÖLL, H. | |
dc.date.accessioned | 2019-10-22T10:00:52Z | |
dc.date.available | 2019-10-22T10:00:52Z | |
dc.date.issued | 2011 | |
dc.identifier.citation | COJOCARU, A., CARSTENSEN, J., BOOR, J. et al. Investigation of Mesoporous Structures for Thermoelectric Applications. In: ICNBME-2011. International conference on Nanotechnologies and Biomedical Engineering. German-moldovan workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the intern. conf., July 7-8, 2011. Chişinău, 2011, pp. 21-23. ISBN 978-9975-66-239-0. | en_US |
dc.identifier.isbn | 978-9975-66-239-0 | |
dc.identifier.uri | http://repository.utm.md/handle/5014/4995 | |
dc.description.abstract | Mesoporous silicon is an attractive material for thermoelectric application. For pore wall thicknesses around <100nm, phonons can not penetrate the porous layer while electrons still can, due to there smaller mean free path length. The resulting good electrical and bad thermal conductivity is a premise for efficient thermoelectric devices. This paper presents results regarding homogeneity, high porosity, and optimal pore wall thicknesses for porous silicon based thermoelectric devices. | en_US |
dc.language.iso | en | en_US |
dc.publisher | Technical University of Moldova | en_US |
dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.subject | electrochemical etching | en_US |
dc.subject | mesoporous silicon | en_US |
dc.subject | thermoelectric applications | en_US |
dc.title | Investigation of Mesoporous Structures for Thermoelectric Applications | en_US |
dc.type | Article | en_US |
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