Surface relief recording-erasing in amorphous chalcogenide layers and nanocomposites

Abstract

New materials and technologies are under intensive research and development last time for fabrication of separate or integrated photonic elements, matrices, photonic crystals, and metasurfaces in our laboratories and worldwide. Among the wide number of inorganic and organic materials and proper fabrication methods by optical or e-beam lithoghraphy, imprint technology the holographic recording is one of the most known, although the selective etching, development of optical reliefs in standard resists causes essential shortcomings.