Formation of low-dimensional structures on InP under fast anodic etching

MONAICO, Eduard

dc.contributor.author	MONAICO, Eduard
dc.date.accessioned	2019-02-27T10:51:01Z
dc.date.available	2019-02-27T10:51:01Z
dc.date.issued	2016
dc.identifier.citation	MONAICO, Eduard. Formation of low-dimensional structures on InP under fast anodic etching [Resursă electronică]. In: Conferința Tehnico-Științifică a Colaboratorilor, Doctoranzilor și Studenților, Universitatea Tehnică a Moldovei, 26-28 noiembrie, 2015. Chișinău, 2016, vol. 1, pp. 179-182. ISBN 978-9975-45-440-7. ISBN 978-9975-45-441-4 (Vol.1).	en_US
dc.identifier.isbn	978-9975-45-440-7
dc.identifier.uri	http://repository.utm.md/handle/5014/697
dc.description	Resursă electronică	en_US
dc.description.abstract	In this paper, we report on the possibility of cost-effective fabrication of InP nanomembranes and nanowires using fast anodic etching of n-InP single crystalline substrates under potentiostatic conditions. Fast anodic etching means that 2-мm long nanowires are obtained in just 3 s of anodization, i.e., the rate of etching in depth direction is about 40 μm/min. Uniform electrochemical depositions of Au dots on InP nanowires is demonstrated.	en_US
dc.language.iso	en	en_US
dc.publisher	Tehnica UTM	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	nanomembranes	en_US
dc.subject	nanowires	en_US
dc.subject	electrochemical etching	en_US
dc.subject	electrochemical deposition	en_US
dc.title	Formation of low-dimensional structures on InP under fast anodic etching	en_US
dc.type	Article	en_US