Rapid photothermal processing for functionalization of nanostructured thin films

SHISHIYANU, S.; URSAKI, V. V.; GHIMPU, L.; LUPAN, O.; TIGINYANU, I.; SHISHIYANU, T.

dc.contributor.author	SHISHIYANU, S.
dc.contributor.author	URSAKI, V. V.
dc.contributor.author	GHIMPU, L.
dc.contributor.author	LUPAN, O.
dc.contributor.author	TIGINYANU, I.
dc.contributor.author	SHISHIYANU, T.
dc.date.accessioned	2020-08-28T08:34:05Z
dc.date.available	2020-08-28T08:34:05Z
dc.date.issued	2011
dc.identifier.citation	SHISHIYANU, S., URSAKI, V. V., GHIMPU, L. Rapid photothermal processing for functionalization of nanostructured thin films. In: International Semiconductor Conference: proc. CAS 2011, 17-19 Oct. 2011, Sinaia, Romania, 2011, V. 2, pp. 245-248. ISBN: 978-1-61284-172-4.	en_US
dc.identifier.isbn	978-1-61284-172-4
dc.identifier.uri	http://repository.utm.md/handle/5014/9135
dc.description	Access ful text: https://doi.org/10.1109/SMICND.2011.6095782	en_US
dc.description.abstract	A rapid photothermal processing (RPP) technique has been developed to functionalize a new generation of nanostructured zinc oxide film materials. An environment-friendly chemical process was used to obtain nanostructures. The post-growth RPP at 650°C in N2 atmosphere of the nanostructured zinc oxide films leads to the suppression of deep-defect-level emission, improvement of near-band edge emission and was ascribed to the decrease of the structure defects compared to the initial nanostructures. The sensitivity of the nanostructured zinc oxide films to 100 ppm ammonia for the operation temperatures between 20°C and 300°C was essentially improved by RPP.	en_US
dc.language.iso	en	en_US
dc.publisher	Institute of Electrical and Electronics Engineerings, IEEE	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	crystal defects	en_US
dc.subject	crystals	en_US
dc.subject	deep levels	en_US
dc.subject	semiconductors	en_US
dc.subject	depositions	en_US
dc.subject	nanofabrication	en_US
dc.subject	nanostructured materials	en_US
dc.subject	photoluminescence	en_US
dc.subject	photothermal effects	en_US
dc.subject	Raman spectra	en_US
dc.subject	semiconductor thin films	en_US
dc.subject	wide band gap semiconductors	en_US
dc.subject	zinc compounds	en_US
dc.subject	photothermal processing	en_US
dc.subject	nanostructured thin films	en_US
dc.subject	deep-defect-level emission	en_US
dc.subject	near-band edge emission	en_US
dc.subject	emissions	en_US
dc.subject	ammonia	en_US
dc.subject	zinc oxide	en_US
dc.subject	thin films	en_US
dc.subject	films	en_US
dc.subject	nanostructures	en_US
dc.subject	temperature sensors	en_US
dc.subject	annealing	en_US
dc.subject	chemical growth	en_US
dc.title	Rapid photothermal processing for functionalization of nanostructured thin films	en_US
dc.type	Article	en_US