Optimized growth of VO2 thin films by metalorganic aerosol deposition

Abstract

VO2 is a unique strongly correlated material that possesses a first order phase transition from tetragonal to monoclinic structure at near room temperature (68℃) with simultaneous ultrafast changes in electrical and optical properties. The exclusive properties of VO2 make it challenging material for diverse applications, including, but not limiting to optical modulators, infrared bolometers and smart windows for energy-efficient buildings. Majority of physical and chemical methods of thin film deposition have been utilized to VO2, but for high-throughput manufacturing, which requested, for example, by the smart windows, atmospheric pressure chemical vapour deposition has significant advantages over other deposition techniques due to lack of vacuum and compatibility with on-line float-glass production. For this purpose we used the metalorganic aerosol deposition (MAD), which is a variation of atmospheric pressure CVD technique developed by our group.