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Phase Transition in Laser Irradiated TiO2 Thin Films

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dc.contributor.author LUNGU, I.
dc.contributor.author GHIMPU, L.
dc.contributor.author POTLOG, T.
dc.contributor.author MEDVIDS, A.
dc.contributor.author MOISE, C.
dc.date.accessioned 2021-11-11T13:12:45Z
dc.date.available 2021-11-11T13:12:45Z
dc.date.issued 2021
dc.identifier.citation LUNGU, I., GHIMPU, L., POTLOG, T., MEDVIDS, A., MOISE, C. Phase Transition in Laser Irradiated TiO2 Thin Films. In: ICNMBE-2021: the 5th International Conference on Nanotechnologies and Biomedical Engineering, November 3-5, 2021: Program and abstract book. Chişinău, 2021, p. 62. ISBN 978-9975-72-592-7. en_US
dc.identifier.isbn 978-9975-72-592-7
dc.identifier.uri http://repository.utm.md/handle/5014/17971
dc.description Only Abstract. en_US
dc.description.abstract In this study, the laser processing of thermally annealed TiO2 thin films at 420 ℃ in hydrogen atmosphere, utilizing an pulsed fourth-harmonic generation Nd: YAG laser employing different laser intensities in the atmosphere at room temperature, has been reported. Further, the surface morphology and crystalline structure have been investigated by means of atomic force microscopy [AFM], X-ray diffraction [XRD], Raman analysis. The AFM images obtained show that the film’s surface changes as the effect of the laser processes. Moreover, XRD and Raman analysis of the TiO2 thin films indicate at the threshold laser intensity, Ith = 66 MW/cm2 of the fourth-harmonic generation Nd: YAG laser phase transition from atanase-rutile to a crystalline 100% rutile. en_US
dc.language.iso en en_US
dc.publisher Universitatea Tehnică a Moldovei en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject TiO2 Thin Films en_US
dc.subject laser processes en_US
dc.subject hydrogen atmosphere en_US
dc.title Phase Transition in Laser Irradiated TiO2 Thin Films en_US
dc.type Article en_US


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