Abstract:
Nowadays, two types of templates are widely used for nanofabrication purposes, namely porous Al2O3 and etched ion track membranes based either on inorganic materials or on organic polymers. Both, porous Al2O3 and etched ion track membranes, however, exhibit high resistivity and therefore they often play a passive role in nanofabrication processes. In this connection an important technological task is the development of cost-effective semiconductor nanotemplates which properties could be easily controlled by external illumination, applied electric fields etc. We report on controlled fabrication of semiconductor nanotemplates using anodic etching of III-V (GaP, InP) and II-VI (ZnSe, ZnCdS, CdSe) crystalline substrates, self-organized processes being evidenced and studied in some materials.