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New vapor deposited dielectric polymer thin films for electronic applications

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dc.contributor.author SCHRÖDER, Stefan
dc.contributor.author STRUNSKUS, Thomas
dc.contributor.author ABABII, Nicolai
dc.contributor.author LUPAN, Oleg
dc.contributor.author MAGARIU, Nicolae
dc.contributor.author FAUPEL, Franz
dc.date.accessioned 2022-04-20T08:41:40Z
dc.date.available 2022-04-20T08:41:40Z
dc.date.issued 2021
dc.identifier.citation SCHRÖDER, Stefan, STRUNSKUS, Thomas, ABABII, Nicolai et al. New vapor deposited dielectric polymer thin films for electronic applications. In: International Conference on Electronics, Communications and Computing: proc. IC ECCO, 21-22 Oct. 2021, Chişinău. Republica Moldova, 2021, pp. 94-96. ISBN 978-9975-4264-8-0. en_US
dc.identifier.isbn 978-9975-4264-8-0
dc.identifier.uri http://repository.utm.md/handle/5014/20172
dc.identifier.uri https://doi.org/10.52326/ic-ecco.2021/EL.02
dc.description.abstract Initiated chemical vapor deposition (iCVD) is a solvent-free polymer thin film deposition process which can be used to produce high quality dielectric thin films with nanoscale control and circumvents thus these problems. This work demonstrates the versatility of the iCVD process in the field of electrical applications by some new application examples of iCVD coatings. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject dielectric thin films en_US
dc.subject thin films en_US
dc.subject films en_US
dc.subject polymer thin films en_US
dc.title New vapor deposited dielectric polymer thin films for electronic applications en_US
dc.type Article en_US


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  • 2021
    Proceedings of the 11th IC|ECCO; October 21-22, 2021

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Attribution-NonCommercial-NoDerivs 3.0 United States Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 United States

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