Two-step cost-effective electrochemical technology for the preparation of free-standing perforated Au nanomembranes

Abstract

Herein, we propose a room-temperature two-step cost effective electrochemical technology for the preparation of free-standing Au nanomembranes. A thin Au film with thickness less than 100 nm was deposited by pulsed electroplating on a GaAs substrate wafer in the first step, while electrochemical etching was applied in the second technological step to introduce porosity into the GaAs substrate underneath the Au film. It was shown that detachment of the film from the substrate occurs at optimized parameters of anodic etching.