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Two-step cost-effective electrochemical technology for the preparation of free-standing perforated Au nanomembranes

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dc.contributor.author MONAICO, Eduard
dc.contributor.author MONAICO, Elena
dc.contributor.author URSAKI, Veaceslav
dc.contributor.author TIGINYANU, Ion
dc.date.accessioned 2022-05-24T09:21:40Z
dc.date.available 2022-05-24T09:21:40Z
dc.date.issued 2020
dc.identifier.citation MONAICO, Eduard, MONAICO, Elena, URSAKI, Veaceslav et al. Two-step cost-effective electrochemical technology for the preparation of free-standing perforated Au nanomembranes. In: European Exhibition of Creativity and Innovation: proc. of the 12th ed. EUROINVENT, Iasi, Romania, 2020, p. 152. ISSN 2601-4564. e-ISSN 2601-4572. en_US
dc.identifier.issn 2601-4564
dc.identifier.issn 2601-4572
dc.identifier.uri http://repository.utm.md/handle/5014/20382
dc.description.abstract Herein, we propose a room-temperature two-step cost effective electrochemical technology for the preparation of free-standing Au nanomembranes. A thin Au film with thickness less than 100 nm was deposited by pulsed electroplating on a GaAs substrate wafer in the first step, while electrochemical etching was applied in the second technological step to introduce porosity into the GaAs substrate underneath the Au film. It was shown that detachment of the film from the substrate occurs at optimized parameters of anodic etching. en_US
dc.language en
dc.publisher Romanian Inventors Forum en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject invenţii en_US
dc.subject inventions en_US
dc.subject aurum nanomembranes en_US
dc.subject thin films en_US
dc.subject electrochemical etching en_US
dc.subject anodic etching en_US
dc.title Two-step cost-effective electrochemical technology for the preparation of free-standing perforated Au nanomembranes en_US
dc.type Article en_US


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  • 2020
    Proceedings of the 12 th Edition of European Exhibition of Creativity and Innovation, Romania

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Attribution-NonCommercial-NoDerivs 3.0 United States Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 United States

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