Micro- and nano-engineering of III-V and II-VI semiconductor compounds and metal nanostructures based on electrochemical technologies for multifunctional applications

Abstract

This book is devoted to issues related to fabrication and comparative characterization of porous III-V and II-VI semiconductor compounds fabricated by electrochemical etching. Nowadays, anodization of semiconductor compounds represents a cost-effective top-down approach in nanofabrication. To extend the area of applications it was proposed to combine electrochemical etching and pulsed electrochemical deposition approaches for micro-nanodevice manufacturing. The versatility of morphologies and the application of porous semiconductor compounds will be discussed in details in this book.