Abstract:
In this work was solved a complex of problems caused by purely electrochemical characteristics of the technology of obtaining nanowires arrays of semimetal Bi, which concerns: (i) prediction of the growth rate of layers at electrodeposition and the achievement of desired thickness for a specified time; (ii) the revealing of the nature of the growth rate restrictions, and (iii) the revealing of the conditions of electrodeposition being uniform with respect to both the layer thickness and the surface. The solution of the mentioned problems relates to the kinetics of the specific electrochemical process being the basis of nanodimensional electrodeposition.