DSpace Repository
Using of the MEAM model for adjusting the technological parameters of magnetron deposition of Nb/Co nanolayers
JavaScript is disabled for your browser. Some features of this site may not work without it.
| dc.contributor.author | BOIAN, Vladimir | |
| dc.contributor.author | BOIAN, Eugen | |
| dc.date.accessioned | 2024-04-25T08:54:54Z | |
| dc.date.available | 2024-04-25T08:54:54Z | |
| dc.date.issued | 2024 | |
| dc.identifier.citation | BOIAN, Vladimir, BOIAN, Eugen. Using of the MEAM model for adjusting the technological parameters of magnetron deposition of Nb/Co nanolayers. In: Quo Vadis – Ethics of the Scientific Research: conf. NANO-2024, event devoted to the 60th anniversary of the Technical University of Moldova, 15-18 April 2024, Chişinău, Republica Moldova: Program and proceedings of the conference, Chişinău 2024, pp. 67. ISBN 978-9975-64-422-8. | en_US |
| dc.identifier.isbn | 978-9975-64-422-8 | |
| dc.identifier.uri | http://repository.utm.md/handle/5014/26910 | |
| dc.description.abstract | Superconductivity and ferromagnetism being two antagonistic orders, we can meet them only in artificial formations, usually in the form of nanolayers deposited by certain technological methods. A common and highly effective method is the deposition of nanolayers by the magnetron method. Deposition by the magnetron sputtering method proposes nanofilms of well- controlled thicknesses, deposition in a single vacuum cycle and reproduction of layered structures with high precision. | en_US |
| dc.language.iso | en | en_US |
| dc.publisher | Technical University of Moldova | en_US |
| dc.relation.ispartofseries | NANO-2024 "Quo Vadis – Ethics of the Scientific Research", event devoted to the 60th anniversary of the Technical University of Moldova;15-18 April 2024, Chişinău, Republica Moldova | |
| dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
| dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
| dc.subject | modified embedded atom method (MEAM) | en_US |
| dc.subject | magnetron method | en_US |
| dc.subject | nanolayers | en_US |
| dc.subject | nanofilms | en_US |
| dc.title | Using of the MEAM model for adjusting the technological parameters of magnetron deposition of Nb/Co nanolayers | en_US |
| dc.type | Article | en_US |
Files in this item
The following license files are associated with this item:
This item appears in the following Collection(s)
Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 United States