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Nanolayers of the Au0x0SnO2 nanocomposite synthesized by successive ionic layer deposition method

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dc.contributor.author TOLSTOY, V.
dc.contributor.author GULINA, L.
dc.contributor.author KOROTCENKOV, G.
dc.date.accessioned 2019-10-17T09:42:17Z
dc.date.available 2019-10-17T09:42:17Z
dc.date.issued 2005
dc.identifier.citation TOLSTOY, V., GULINA, L., KOROTCENKOV, G. Nanolayers of the Au0x0SnO2 nanocomposite synthesized by successive ionic layer deposition method. In: Microelectronics and Computer Science: proc. of the 4th intern. conf., September 15-17, 2005. Chişinău, 2005, vol. 1, pp. 239-241. ISBN 9975-66-038-X. en_US
dc.identifier.isbn 9975-66-038-X
dc.identifier.uri http://repository.utm.md/handle/5014/4778
dc.description.abstract We studied possibilities of SILD (successive ionic layer deposition) technology for depositing nanocomposite Au0xSnO2 nanolayers. This new method of layer deposition is of high interest, because of the method’s simplicity, cheapness, and ability to deposit thin nano-structured films on rough surfaces. Aqueous 0.01 M solutions of SnCl2 and HAuCl4 were used as precursors for synthesis of the nanocomposite layers on the surface of silica and Si. Optical spectra of such layers are characterised by a band at 200–300 nm consistent with the electronic absorption of the Sn–O polyhedrons and a band at 560–570 nm due to a plasmon generated in the gold nanoparticles, while the FTIR spectra exhibit a band at 580 cm-1, characteristic for the Sn–O stretchings. Based on the spectral dependences on the sample heating in the 200-400 0C range, chemico-structural transformations of the layers were inferred. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject nanolayers en_US
dc.subject nanocomposites en_US
dc.subject nanoparticles en_US
dc.subject ionic layers en_US
dc.title Nanolayers of the Au0x0SnO2 nanocomposite synthesized by successive ionic layer deposition method en_US
dc.type Article en_US


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