Analysis of the Behavior of PVDF Layers Deposited under Various Conditions

dc.contributor.author	COJOCARU, Victor
dc.contributor.author	KATASHEV, Alexei
dc.contributor.author	TEODORESCU, Horia-Nicolai
dc.date.accessioned	2019-10-23T07:59:33Z
dc.date.available	2019-10-23T07:59:33Z
dc.date.issued	2011
dc.identifier.citation	COJOCARU, Victor, KATASHEV, Alexei, TEODORESCU, Horia-Nicolai. Analysis of the Behavior of PVDF Layers Deposited under Various Conditions. In: ICNBME-2011. International conference on Nanotechnologies and Biomedical Engineering. German-moldovan workshop on Novel Nanomaterials for Electronic, Photonic and Biomedical Applications: proc. of the intern. conf., July 7-8, 2011. Chişinău, 2011, pp. 80-82. ISBN 978-9975-66-239-0.	en_US
dc.identifier.isbn	978-9975-66-239-0
dc.identifier.uri	http://repository.utm.md/handle/5014/5055
dc.description.abstract	We analyze the surface and piezoelectric properties of PVDF films deposited on the surface of Si wafer by solution casting under various conditions of temperature and electric field.	en_US
dc.language.iso	en	en_US
dc.publisher	Technical University of Moldova	en_US
dc.rights	Attribution-NonCommercial-NoDerivs 3.0 United States	*
dc.rights.uri	http://creativecommons.org/licenses/by-nc-nd/3.0/us/	*
dc.subject	PVDF layers	en_US
dc.subject	PVDF films	en_US
dc.subject	films	en_US
dc.title	Analysis of the Behavior of PVDF Layers Deposited under Various Conditions	en_US
dc.type	Article	en_US