Surface Modification of Ti by Chemical Etching and HA Sputtering for Dental Applications

Abstract

This work presents the surface modifications obtained in a two-step chemical etching process consisting of chemical etching and subsequent post etching. The additional post-etching results in an increased cell proliferation of almost 50% compared to the non-post-etched. An additional hydroxyapatite coating (about 160 nm thickness) is highly beneficial to further increase the cell adhesion on the etched Ti surface.