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Nanocrystalline and amorphous tellurium films for gas sensing applications

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dc.contributor.author TSIULYANU, D.
dc.contributor.author MOCREAC, O.
dc.contributor.author AFANASIEV, A.
dc.date.accessioned 2019-11-03T19:50:10Z
dc.date.available 2019-11-03T19:50:10Z
dc.date.issued 2019
dc.identifier.citation TSIULYANU, D., MOCREAC, O., AFANASIEV, A. Nanocrystalline and amorphous tellurium films for gas sensing applications. In: Amorphous and Nanostructured Chalcogenides. Abstract Book: proc. of the 9th International Conference, 30 June – 4 July, 2019. Chişinău, 2019, pp. 34-35. en_US
dc.identifier.uri http://repository.utm.md/handle/5014/5959
dc.description Abstract en_US
dc.description.abstract Microstructural peculiarities and gas (NO2) sensing properties of tellurium thin films dependent on the technological procedures of their physical grow are presented. The fabrication of the films was provided using thermal vacuum evaporation method but the investigation were focused to establish the interdependence between the technological conditions of their growth process and both structure / morphology and gas sensing properties. Tellurium (purity 99.999 %) based thin films have been prepared using different grow rates (10 - 40 nm/s) onto Pyrex glass, sintered alumina (Al2O3) or Si/SiO2 substrates. en_US
dc.language.iso en en_US
dc.publisher Tehnica UTM en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject tellurium films en_US
dc.subject gas sensing en_US
dc.subject thin films en_US
dc.title Nanocrystalline and amorphous tellurium films for gas sensing applications en_US
dc.type Article en_US


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