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Oxygen-dependent formation of VO2 Thin Films by Metalorganic Aerosol Deposition

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dc.contributor.author BELENCHUK, A.
dc.contributor.author SHAPOVAL, O.
dc.contributor.author ZASAVITSKY, E.
dc.contributor.author VATAVU, S.
dc.contributor.author CHIRITA, A.
dc.contributor.author MOSHNYAGA, V.
dc.date.accessioned 2020-05-04T10:40:02Z
dc.date.available 2020-05-04T10:40:02Z
dc.date.issued 2018
dc.identifier.citation BELENCHUK, A., SHAPOVAL, O., ZASAVITSKY, E.et al. Oxygen-dependent formation of VO2 Thin Films by Metalorganic Aerosol Deposition. In: Telecomunicaţii, Electronică şi Informatică: proc. of the 6th intern. conf., May 24-27, 2018. Chişinău, 2018, pp. 115-118. ISBN 978-9975-45-540-4. en_US
dc.identifier.isbn 978-9975-45-540-4
dc.identifier.uri http://repository.utm.md/handle/5014/8062
dc.description.abstract We report on the growth and properties of vanadium dioxide (VO2) on amorphous and oriented substrates by the low-cost and industry-oriented method of metalorganic aerosol deposition (MAD). X-ray diffraction and temperaturedependent Raman spectroscopy confirm formation of single phase tin films. Abrupt change of resistance by 5×103 times and steep drop of infrared transmission from 49 to 10% at 1700 nm pave the way for application of MAD technique in fabrication of VO2-based optoelectronic and thermochromic devices, such as “smart windows”. en_US
dc.language.iso en en_US
dc.publisher Tehnica UTM en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject thin films en_US
dc.subject metalorganic aerosol depositions en_US
dc.subject surfaces morphology en_US
dc.subject crystal structures en_US
dc.subject spectroscopy en_US
dc.subject resistance switching en_US
dc.subject optical transmittance en_US
dc.title Oxygen-dependent formation of VO2 Thin Films by Metalorganic Aerosol Deposition en_US
dc.type Article en_US


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