DSpace Repository

Influence of the Growth Temperature on the Properties of the Transparent and Conductive NiO Thin Films Obtained by RF Magnetron Sputtering

Show simple item record

dc.contributor.author GHIMPU, L.
dc.contributor.author SUMAN, V.
dc.contributor.author RUSNAC, D.
dc.date.accessioned 2020-05-31T14:34:46Z
dc.date.available 2020-05-31T14:34:46Z
dc.date.issued 2019
dc.identifier.citation GHIMPU, L., SUMAN, V., RUSNAC, D. Influence of the Growth Temperature on the Properties of the Transparent and Conductive NiO Thin Films Obtained by RF Magnetron Sputtering. In: ICNMBE-2019: International conference on Nanotechnologies and Biomedical Engineering: proc. of the 4rd intern. conf., Sept. 18-21, 2019: Program and Abstract Book. Chişinău, 2019, p. 97. ISBN 978-9975-72-392-3. en_US
dc.identifier.isbn 978-9975-72-392-3
dc.identifier.uri http://repository.utm.md/handle/5014/8519
dc.identifier.uri https://doi.org/10.1007/978-3-030-31866-6_57
dc.description Access full text - https://doi.org/10.1007/978-3-030-31866-6_57 en_US
dc.description.abstract Transparent and conductive nickel oxide (NiO) thin films were deposited on the glass supports by magnetron pulverization (RF). The NiO thin films were investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), SEM equipped with X-ray detector-analyzer (EDX), UV-VIS spectroscopy and Hall measurements. XRD revealed that the NiO thin films obtained at different substrate temperatures are textured and possess a cubic crystalline structure. SEM analysis indicates the formation of the crystallites with a granular structure. The EDX spectra of the NiO thin films highlighted the presence of Ni and O as elementary components. With the increase of the substrate temperature from 50 to 450 °C Hall measurements show a decrease of the resistivity of the NiO thin layers due to the increase of the concentration and mobility of the free carriers. en_US
dc.language.iso en en_US
dc.publisher Tehnica UTM en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject magnetron pulverization en_US
dc.subject thin films en_US
dc.subject spectroscopy en_US
dc.subject electrical properties en_US
dc.title Influence of the Growth Temperature on the Properties of the Transparent and Conductive NiO Thin Films Obtained by RF Magnetron Sputtering en_US
dc.type Article en_US


Files in this item

The following license files are associated with this item:

This item appears in the following Collection(s)

Show simple item record

Attribution-NonCommercial-NoDerivs 3.0 United States Except where otherwise noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 United States

Search DSpace


Advanced Search

Browse

My Account