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Optimized growth of VO2 thin films by metalorganic aerosol deposition

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dc.contributor.author SHAPOVAL, O.
dc.contributor.author BELENCHUK, A.
dc.contributor.author ZASAVITCHI, E.
dc.contributor.author VATAVU, S.
dc.contributor.author CHIRITA, A.
dc.date.accessioned 2020-12-09T09:41:39Z
dc.date.available 2020-12-09T09:41:39Z
dc.date.issued 2017
dc.identifier.citation SHAPOVAL, O., BELENCHUK, A., ZASAVITCHI, E., VATAVU, S., CHIRITA, A. Optimized growth of VO2 thin films by metalorganic aerosol deposition. In: Microelectronics and Computer Science: proc. of the 9th intern. conf., October 19-21, 2017. Chişinău, 2017, p. 500. ISBN 978-9975-4264-8-0. en_US
dc.identifier.isbn 978-9975-4264-8-0
dc.identifier.uri http://repository.utm.md/handle/5014/12010
dc.description.abstract VO2 is a unique strongly correlated material that possesses a first order phase transition from tetragonal to monoclinic structure at near room temperature (68℃) with simultaneous ultrafast changes in electrical and optical properties. The exclusive properties of VO2 make it challenging material for diverse applications, including, but not limiting to optical modulators, infrared bolometers and smart windows for energy-efficient buildings. Majority of physical and chemical methods of thin film deposition have been utilized to VO2, but for high-throughput manufacturing, which requested, for example, by the smart windows, atmospheric pressure chemical vapour deposition has significant advantages over other deposition techniques due to lack of vacuum and compatibility with on-line float-glass production. For this purpose we used the metalorganic aerosol deposition (MAD), which is a variation of atmospheric pressure CVD technique developed by our group. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject thin films en_US
dc.subject MAD method en_US
dc.subject Raman spectroscopy en_US
dc.title Optimized growth of VO2 thin films by metalorganic aerosol deposition en_US
dc.type Article en_US


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