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Study of the effect of heat treatment on optical and electrical parameters of CuO films

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dc.contributor.author SUMAN, V.
dc.contributor.author LUNGU, I.
dc.contributor.author POTLOG, T.
dc.contributor.author GHIMPU, L.
dc.date.accessioned 2024-04-26T07:11:02Z
dc.date.available 2024-04-26T07:11:02Z
dc.date.issued 2024
dc.identifier.citation SUMAN, V. et al. Study of the effect of heat treatment on optical and electrical parameters of CuO films. In: Quo Vadis – Ethics of the Scientific Research: conf. NANO-2024, event devoted to the 60th anniversary of the Technical University of Moldova, 15-18 April 2024, Chişinău, Republica Moldova: Program and proceedings of the conference, Chişinău 2024, pp. 106-107. ISBN 978-9975-64-422-8. en_US
dc.identifier.isbn 978-9975-64-422-8
dc.identifier.uri http://repository.utm.md/handle/5014/26937
dc.description.abstract The effect of vacuum heat treatment of CuO films obtained using RF magnetron sputtering at a pressure of 10-5 Pa for further use in CuO/ZnO and CuO/TiO2 heterojunctions was studied. A 99.95% pure Cu wafer with a diameter of 50 mm and a thickness of 2 mm was used as a target. The sapphire supports used had a dimension of 20 × 20 mm. The pressure in the chamber was 5.4 x 10–5 Pa, and the target–support distance was 80 mm. The temperature of the holder was kept constant at 500oC, and the O2/Ar ratio in the gas flow was 3 : 5, respectively. Film deposition took place under the following conditions: a pressure of 7.4 × 10–3 Pa, a magnetron power of 80 W, and a condensation rate of 5 nm/min. en_US
dc.language.iso en en_US
dc.publisher Technical University of Moldova en_US
dc.relation.ispartofseries NANO-2024 "Quo Vadis – Ethics of the Scientific Research", event devoted to the 60th anniversary of the Technical University of Moldova;15-18 April 2024, Chişinău, Republica Moldova
dc.rights Attribution-NonCommercial-NoDerivs 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-nd/3.0/us/ *
dc.subject heterojunctions en_US
dc.subject vacuum heat treatment en_US
dc.subject copper oxide films en_US
dc.subject magnetron sputtering en_US
dc.title Study of the effect of heat treatment on optical and electrical parameters of CuO films en_US
dc.type Article en_US


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