dc.contributor.author | SUMAN, V. | |
dc.contributor.author | LUNGU, I. | |
dc.contributor.author | POTLOG, T. | |
dc.contributor.author | GHIMPU, L. | |
dc.date.accessioned | 2024-04-26T07:11:02Z | |
dc.date.available | 2024-04-26T07:11:02Z | |
dc.date.issued | 2024 | |
dc.identifier.citation | SUMAN, V. et al. Study of the effect of heat treatment on optical and electrical parameters of CuO films. In: Quo Vadis – Ethics of the Scientific Research: conf. NANO-2024, event devoted to the 60th anniversary of the Technical University of Moldova, 15-18 April 2024, Chişinău, Republica Moldova: Program and proceedings of the conference, Chişinău 2024, pp. 106-107. ISBN 978-9975-64-422-8. | en_US |
dc.identifier.isbn | 978-9975-64-422-8 | |
dc.identifier.uri | http://repository.utm.md/handle/5014/26937 | |
dc.description.abstract | The effect of vacuum heat treatment of CuO films obtained using RF magnetron sputtering at a pressure of 10-5 Pa for further use in CuO/ZnO and CuO/TiO2 heterojunctions was studied. A 99.95% pure Cu wafer with a diameter of 50 mm and a thickness of 2 mm was used as a target. The sapphire supports used had a dimension of 20 × 20 mm. The pressure in the chamber was 5.4 x 10–5 Pa, and the target–support distance was 80 mm. The temperature of the holder was kept constant at 500oC, and the O2/Ar ratio in the gas flow was 3 : 5, respectively. Film deposition took place under the following conditions: a pressure of 7.4 × 10–3 Pa, a magnetron power of 80 W, and a condensation rate of 5 nm/min. | en_US |
dc.language.iso | en | en_US |
dc.publisher | Technical University of Moldova | en_US |
dc.relation.ispartofseries | NANO-2024 "Quo Vadis – Ethics of the Scientific Research", event devoted to the 60th anniversary of the Technical University of Moldova;15-18 April 2024, Chişinău, Republica Moldova | |
dc.rights | Attribution-NonCommercial-NoDerivs 3.0 United States | * |
dc.rights.uri | http://creativecommons.org/licenses/by-nc-nd/3.0/us/ | * |
dc.subject | heterojunctions | en_US |
dc.subject | vacuum heat treatment | en_US |
dc.subject | copper oxide films | en_US |
dc.subject | magnetron sputtering | en_US |
dc.title | Study of the effect of heat treatment on optical and electrical parameters of CuO films | en_US |
dc.type | Article | en_US |
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